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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/isqed/SukharevMKMKCLHOKK09>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ara_Markosian>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Armen_Kteyan>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Hasmik_Lazaryan>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Henrik_Hovsepyan>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jun-Ho_Choy>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Levon_Manukyan>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Nikolay_Khachatryan>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Seiji_Onoue>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Takuo_Kikuchi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Tetsuya_Kamigaki>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Valeriy_Sukharev>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FISQED.2009.4810286>
foaf:homepage <https://doi.org/10.1109/ISQED.2009.4810286>
dc:identifier DBLP conf/isqed/SukharevMKMKCLHOKK09 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FISQED.2009.4810286 (xsd:string)
dcterms:issued 2009 (xsd:gYear)
rdfs:label Control of design specific variation in etch-assisted via pattern transfer by means of full-chip simulation. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ara_Markosian>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Armen_Kteyan>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Hasmik_Lazaryan>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Henrik_Hovsepyan>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jun-Ho_Choy>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Levon_Manukyan>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Nikolay_Khachatryan>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Seiji_Onoue>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Takuo_Kikuchi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Tetsuya_Kamigaki>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Valeriy_Sukharev>
swrc:pages 156-161 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/isqed/2009>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/isqed/SukharevMKMKCLHOKK09/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/isqed/SukharevMKMKCLHOKK09>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/isqed/isqed2009.html#SukharevMKMKCLHOKK09>
rdfs:seeAlso <https://doi.org/10.1109/ISQED.2009.4810286>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/isqed>
dc:title Control of design specific variation in etch-assisted via pattern transfer by means of full-chip simulation. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document