A 20nm 112Mb SRAM in High-–ļ metal-gate with assist circuitry for low-leakage and low-VMIN applications.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/isscc/ChangCCCLLCNLWLWCCC13
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A 20nm 112Mb SRAM in High-–ļ metal-gate with assist circuitry for low-leakage and low-VMIN applications.
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