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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/isscc/KudvaSTNSZG24>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Brian_Zimmer>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/C._Thomas_Gray>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Mahmut_Ersin_Sinangil>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Nikola_Nedovic>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sanquan_Song>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Stephen_G._Tell>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sudhir_S._Kudva>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FISSCC49657.2024.10454365>
foaf:homepage <https://doi.org/10.1109/ISSCC49657.2024.10454365>
dc:identifier DBLP conf/isscc/KudvaSTNSZG24 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FISSCC49657.2024.10454365 (xsd:string)
dcterms:issued 2024 (xsd:gYear)
rdfs:label 16.4 High-Density and Low-Power PUF Designs in 5nm Achieving 23√ó and 39√ó BER Reduction After Unstable Bit Detection and Masking. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Brian_Zimmer>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/C._Thomas_Gray>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Mahmut_Ersin_Sinangil>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Nikola_Nedovic>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sanquan_Song>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Stephen_G._Tell>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sudhir_S._Kudva>
swrc:pages 302-304 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/isscc/2024>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/isscc/KudvaSTNSZG24/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/isscc/KudvaSTNSZG24>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/isscc/isscc2024.html#KudvaSTNSZG24>
rdfs:seeAlso <https://doi.org/10.1109/ISSCC49657.2024.10454365>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/isscc>
dc:title 16.4 High-Density and Low-Power PUF Designs in 5nm Achieving 23√ó and 39√ó BER Reduction After Unstable Bit Detection and Masking. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document