Reducing device yield fallout at wafer level test with electrohydrodynamic (EHD) cleaning.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/itc/BrozAR00
Home
|
Example Publications
Property
Value
dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/conf/itc/BrozAR00
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/James_C._Andersen
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Jerry_J._Broz
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Reynaldo_M._Rincon
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2FTEST.2000.894240
>
foaf:
homepage
<
https://doi.org/10.1109/TEST.2000.894240
>
dc:
identifier
DBLP conf/itc/BrozAR00
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2FTEST.2000.894240
(xsd:string)
dcterms:
issued
2000
(xsd:gYear)
rdfs:
label
Reducing device yield fallout at wafer level test with electrohydrodynamic (EHD) cleaning.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/James_C._Andersen
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Jerry_J._Broz
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Reynaldo_M._Rincon
>
swrc:
pages
477-484
(xsd:string)
dcterms:
partOf
<
https://dblp.l3s.de/d2r/resource/publications/conf/itc/2000
>
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/conf/itc/BrozAR00/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/conf/itc/BrozAR00
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/conf/itc/itc2000.html#BrozAR00
>
rdfs:
seeAlso
<
https://doi.org/10.1109/TEST.2000.894240
>
swrc:
series
<
https://dblp.l3s.de/d2r/resource/conferences/itc
>
dc:
title
Reducing device yield fallout at wafer level test with electrohydrodynamic (EHD) cleaning.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:InProceedings
rdf:
type
foaf:Document