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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/nccet/WangZLXXH15>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Bin_Wang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Caixia_Huang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Guoli_Li>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Hui_Xu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yu_Xia>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yun_Zeng>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1007%2F978-3-662-49283-3%5F17>
foaf:homepage <https://doi.org/10.1007/978-3-662-49283-3_17>
dc:identifier DBLP conf/nccet/WangZLXXH15 (xsd:string)
dc:identifier DOI doi.org%2F10.1007%2F978-3-662-49283-3%5F17 (xsd:string)
dcterms:issued 2015 (xsd:gYear)
rdfs:label Analysis and Simulation of Temperature Characteristic of Sensitivity for SOI Lateral PIN Photodiode Gated by Transparent Electrode. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Bin_Wang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Caixia_Huang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Guoli_Li>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Hui_Xu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yu_Xia>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yun_Zeng>
swrc:pages 173-181 (xsd:string)
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rdfs:seeAlso <https://doi.org/10.1007/978-3-662-49283-3_17>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/nccet>
dc:title Analysis and Simulation of Temperature Characteristic of Sensitivity for SOI Lateral PIN Photodiode Gated by Transparent Electrode. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document