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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/nems/LiuWYL10>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chun_Yang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Wei_Wang_0087>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yaoping_Liu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Zhihong_Li>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FNEMS.2010.5592215>
foaf:homepage <https://doi.org/10.1109/NEMS.2010.5592215>
dc:identifier DBLP conf/nems/LiuWYL10 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FNEMS.2010.5592215 (xsd:string)
dcterms:issued 2010 (xsd:gYear)
rdfs:label Aluminum-photoresist dual-layer lift-off process for gold micropattern preparation in cellular researches. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chun_Yang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Wei_Wang_0087>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yaoping_Liu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Zhihong_Li>
swrc:pages 297-300 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/nems/2010>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/nems/LiuWYL10/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/nems/LiuWYL10>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/nems/nems2010.html#LiuWYL10>
rdfs:seeAlso <https://doi.org/10.1109/NEMS.2010.5592215>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/nems>
dc:title Aluminum-photoresist dual-layer lift-off process for gold micropattern preparation in cellular researches. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document