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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/nems/MiaoDWZZD10>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Guifu_Ding>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Peihong_Wang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Xiao-Lin_Zhao>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Xiaodan_Miao>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Xiaopeng_Zhang_0008>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Xuhan_Dai>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FNEMS.2010.5592434>
foaf:homepage <https://doi.org/10.1109/NEMS.2010.5592434>
dc:identifier DBLP conf/nems/MiaoDWZZD10 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FNEMS.2010.5592434 (xsd:string)
dcterms:issued 2010 (xsd:gYear)
rdfs:label A new electroplating mask for deep wet etching on glass. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Guifu_Ding>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Peihong_Wang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Xiao-Lin_Zhao>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Xiaodan_Miao>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Xiaopeng_Zhang_0008>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Xuhan_Dai>
swrc:pages 454-457 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/nems/2010>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/nems/MiaoDWZZD10/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/nems/MiaoDWZZD10>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/nems/nems2010.html#MiaoDWZZD10>
rdfs:seeAlso <https://doi.org/10.1109/NEMS.2010.5592434>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/nems>
dc:title A new electroplating mask for deep wet etching on glass. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document