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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/nems/WuBTAZB13>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Haixia_Zhang_0002>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Juergen_Brugger>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/M.-O._Bammatter>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Songmei_Wu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/V._Auzelyte>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Wei_Tang>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FNEMS.2013.6559887>
foaf:homepage <https://doi.org/10.1109/NEMS.2013.6559887>
dc:identifier DBLP conf/nems/WuBTAZB13 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FNEMS.2013.6559887 (xsd:string)
dcterms:issued 2013 (xsd:gYear)
rdfs:label High aspect ratio etching of nanopores in PECVD SiC through AAO mask. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Haixia_Zhang_0002>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Juergen_Brugger>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/M.-O._Bammatter>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Songmei_Wu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/V._Auzelyte>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Wei_Tang>
swrc:pages 986-989 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/nems/2013>
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rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/nems/nems2013.html#WuBTAZB13>
rdfs:seeAlso <https://doi.org/10.1109/NEMS.2013.6559887>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/nems>
dc:title High aspect ratio etching of nanopores in PECVD SiC through AAO mask. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document