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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/nems/YanL12>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jhih-Nan_Yan>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yung-Chun_Lee>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FNEMS.2012.6196717>
foaf:homepage <https://doi.org/10.1109/NEMS.2012.6196717>
dc:identifier DBLP conf/nems/YanL12 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FNEMS.2012.6196717 (xsd:string)
dcterms:issued 2012 (xsd:gYear)
rdfs:label Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jhih-Nan_Yan>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yung-Chun_Lee>
swrc:pages 36-39 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/nems/2012>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/nems/YanL12/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/nems/YanL12>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/nems/nems2012.html#YanL12>
rdfs:seeAlso <https://doi.org/10.1109/NEMS.2012.6196717>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/nems>
dc:title Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document