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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/newcas/BendouRLCR23>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Andreia_Cathelin>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Dimitri_Lederer>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jean-Pierre_Raskin>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Martin_Rack>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Youssef_Bendou>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FNEWCAS57931.2023.10198044>
foaf:homepage <https://doi.org/10.1109/NEWCAS57931.2023.10198044>
dc:identifier DBLP conf/newcas/BendouRLCR23 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FNEWCAS57931.2023.10198044 (xsd:string)
dcterms:issued 2023 (xsd:gYear)
rdfs:label Substrate noise mitigation using high resistivity base silicon wafer for a 14 GHz VCO on 28 nm FD-SOI. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Andreia_Cathelin>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Dimitri_Lederer>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jean-Pierre_Raskin>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Martin_Rack>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Youssef_Bendou>
swrc:pages 1-5 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/newcas/2023>
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rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/newcas/newcas2023.html#BendouRLCR23>
rdfs:seeAlso <https://doi.org/10.1109/NEWCAS57931.2023.10198044>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/newcas>
dc:title Substrate noise mitigation using high resistivity base silicon wafer for a 14 GHz VCO on 28 nm FD-SOI. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document