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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/nvmts/LomenzoS0MSMM19>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Benjamin_Max>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Michael_Hoffmann_0008>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Patrick_D._Lomenzo>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Stefan_Slesazeck>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Thomas_Mikolajick>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Uwe_Schroeder>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FNVMTS47818.2019.9043368>
foaf:homepage <https://doi.org/10.1109/NVMTS47818.2019.9043368>
dc:identifier DBLP conf/nvmts/LomenzoS0MSMM19 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FNVMTS47818.2019.9043368 (xsd:string)
dcterms:issued 2019 (xsd:gYear)
rdfs:label Ferroelectric Hf1-xZrxO2 memories: device reliability and depolarization fields. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Benjamin_Max>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Michael_Hoffmann_0008>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Patrick_D._Lomenzo>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Stefan_Slesazeck>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Thomas_Mikolajick>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Uwe_Schroeder>
swrc:pages 1-8 (xsd:string)
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rdfs:seeAlso <https://doi.org/10.1109/NVMTS47818.2019.9043368>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/nvmts>
dc:title Ferroelectric Hf1-xZrxO2 memories: device reliability and depolarization fields. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document