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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/rws/GidelG0AGBLD20>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Cyril_Luxey>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Fr%E2%88%9A%C2%A9d%E2%88%9A%C2%A9ric_Gianesello>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Gr%E2%88%9A%C2%A9gory_Avenier>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Guillaume_Ducournau>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Michel_Buczko>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Nicolas_Guitard>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Pascal_Chevalier_0002>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Vincent_Gidel>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FRWS45077.2020.9050042>
foaf:homepage <https://doi.org/10.1109/RWS45077.2020.9050042>
dc:identifier DBLP conf/rws/GidelG0AGBLD20 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FRWS45077.2020.9050042 (xsd:string)
dcterms:issued 2020 (xsd:gYear)
rdfs:label Smart Way to Adjust Schottky Barrier Height in 130 nm BiCMOS Process for sub-THz Applications. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Cyril_Luxey>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Fr%E2%88%9A%C2%A9d%E2%88%9A%C2%A9ric_Gianesello>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Gr%E2%88%9A%C2%A9gory_Avenier>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Guillaume_Ducournau>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Michel_Buczko>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Nicolas_Guitard>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Pascal_Chevalier_0002>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Vincent_Gidel>
swrc:pages 337-340 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/rws/2020>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/rws/GidelG0AGBLD20/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/rws/GidelG0AGBLD20>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/rws/rws2020.html#GidelG0AGBLD20>
rdfs:seeAlso <https://doi.org/10.1109/RWS45077.2020.9050042>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/rws>
dc:title Smart Way to Adjust Schottky Barrier Height in 130 nm BiCMOS Process for sub-THz Applications. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document