Fast flexible thin-film transistors with deep submicron channel enabled by nanoimprint lithography.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/rws/SeoLGM16
Home
|
Example Publications
Property
Value
dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/conf/rws/SeoLGM16
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Jung-Hun_Seo
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/L._Jay_Guo
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Tao_Ling
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Zhenqiang_Ma
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2FRWS.2016.7444393
>
foaf:
homepage
<
https://doi.org/10.1109/RWS.2016.7444393
>
dc:
identifier
DBLP conf/rws/SeoLGM16
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2FRWS.2016.7444393
(xsd:string)
dcterms:
issued
2016
(xsd:gYear)
rdfs:
label
Fast flexible thin-film transistors with deep submicron channel enabled by nanoimprint lithography.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Jung-Hun_Seo
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/L._Jay_Guo
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Tao_Ling
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Zhenqiang_Ma
>
swrc:
pages
162-164
(xsd:string)
dcterms:
partOf
<
https://dblp.l3s.de/d2r/resource/publications/conf/rws/2016
>
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/conf/rws/SeoLGM16/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/conf/rws/SeoLGM16
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/conf/rws/rws2016.html#SeoLGM16
>
rdfs:
seeAlso
<
https://doi.org/10.1109/RWS.2016.7444393
>
swrc:
series
<
https://dblp.l3s.de/d2r/resource/conferences/rws
>
dc:
title
Fast flexible thin-film transistors with deep submicron channel enabled by nanoimprint lithography.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:InProceedings
rdf:
type
foaf:Document