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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/sgiot/LinL20>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chia-Ming_Lin>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yun-Wei_Lin>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1007%2F978-3-030-69514-9%5F40>
foaf:homepage <https://doi.org/10.1007/978-3-030-69514-9_40>
dc:identifier DBLP conf/sgiot/LinL20 (xsd:string)
dc:identifier DOI doi.org%2F10.1007%2F978-3-030-69514-9%5F40 (xsd:string)
dcterms:issued 2020 (xsd:gYear)
rdfs:label Optimization of the Deposition Condition for Improving the Ti Film Resistance of DRAM Products. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chia-Ming_Lin>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yun-Wei_Lin>
swrc:pages 527-542 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/sgiot/2020>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/sgiot/LinL20/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/sgiot/LinL20>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/sgiot/sgiot2020.html#LinL20>
rdfs:seeAlso <https://doi.org/10.1007/978-3-030-69514-9_40>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/sgiot>
dc:title Optimization of the Deposition Condition for Improving the Ti Film Resistance of DRAM Products. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document