[RDF data]
Home | Example Publications
PropertyValue
dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/vdat/SharmaJSJG21>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ashwini_Jambhalikar>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Deepak_K._Sharma>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/G._Supriya>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/J._John>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/M._S._Giridhar>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FVDAT53777.2021.9600921>
foaf:homepage <https://doi.org/10.1109/VDAT53777.2021.9600921>
dc:identifier DBLP conf/vdat/SharmaJSJG21 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FVDAT53777.2021.9600921 (xsd:string)
dcterms:issued 2021 (xsd:gYear)
rdfs:label Process Development for Very Deep Etching of Silicon Using Two Layer Masks for Fabrication of Mechanically Decoupled MEMS Gyroscope. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ashwini_Jambhalikar>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Deepak_K._Sharma>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/G._Supriya>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/J._John>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/M._S._Giridhar>
swrc:pages 1-4 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/vdat/2021>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/vdat/SharmaJSJG21/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/vdat/SharmaJSJG21>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/vdat/vdat2021.html#SharmaJSJG21>
rdfs:seeAlso <https://doi.org/10.1109/VDAT53777.2021.9600921>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/vdat>
dc:title Process Development for Very Deep Etching of Silicon Using Two Layer Masks for Fabrication of Mechanically Decoupled MEMS Gyroscope. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document