Doping-Optimized Back-illuminated Single-Photon Avalanche Diode in Stacked 40 nm CIS Technology Achieving 60% PDP at 905 nm.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/vlsit/ParkHEAAYKKCL23
Home
|
Example Publications
Property
Value
dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/conf/vlsit/ParkHEAAYKKCL23
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Dae-Hwan_Ahn
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Doyoon_Eom
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Eunsung_Park
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Hyuk_An
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Jongchae_Kim
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Kyung-Do_Kim
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Myung-Jae_Lee
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Suhyun_Yi
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Won-Yong_Ha
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Woo-Young_Choi
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.23919%2FVLSITechnologyandCir57934.2023.10185229
>
foaf:
homepage
<
https://doi.org/10.23919/VLSITechnologyandCir57934.2023.10185229
>
dc:
identifier
DBLP conf/vlsit/ParkHEAAYKKCL23
(xsd:string)
dc:
identifier
DOI doi.org%2F10.23919%2FVLSITechnologyandCir57934.2023.10185229
(xsd:string)
dcterms:
issued
2023
(xsd:gYear)
rdfs:
label
Doping-Optimized Back-illuminated Single-Photon Avalanche Diode in Stacked 40 nm CIS Technology Achieving 60% PDP at 905 nm.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Dae-Hwan_Ahn
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Doyoon_Eom
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Eunsung_Park
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Hyuk_An
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Jongchae_Kim
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Kyung-Do_Kim
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Myung-Jae_Lee
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Suhyun_Yi
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Won-Yong_Ha
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Woo-Young_Choi
>
swrc:
pages
1-2
(xsd:string)
dcterms:
partOf
<
https://dblp.l3s.de/d2r/resource/publications/conf/vlsit/2023
>
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/conf/vlsit/ParkHEAAYKKCL23/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/conf/vlsit/ParkHEAAYKKCL23
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/conf/vlsit/vlsit2023.html#ParkHEAAYKKCL23
>
rdfs:
seeAlso
<
https://doi.org/10.23919/VLSITechnologyandCir57934.2023.10185229
>
swrc:
series
<
https://dblp.l3s.de/d2r/resource/conferences/vlsit
>
dc:
title
Doping-Optimized Back-illuminated Single-Photon Avalanche Diode in Stacked 40 nm CIS Technology Achieving 60% PDP at 905 nm.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:InProceedings
rdf:
type
foaf:Document