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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/vlsit/ShankerWCLCHMS22>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chenming_Hu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Li-Chen_Wang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Nilotpal_Choudhury>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Nirmaan_Shanker>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sayeef_S._Salahuddin>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Souvik_Mahapatra>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Suraj_S._Cheema>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Wenshen_Li>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FVLSITechnologyandCir46769.2022.9830440>
foaf:homepage <https://doi.org/10.1109/VLSITechnologyandCir46769.2022.9830440>
dc:identifier DBLP conf/vlsit/ShankerWCLCHMS22 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FVLSITechnologyandCir46769.2022.9830440 (xsd:string)
dcterms:issued 2022 (xsd:gYear)
rdfs:label On the PBTI Reliability of Low EOT Negative Capacitance 1.8 nm HfO2-ZrO2 Superlattice Gate Stack on Lg=90 nm nFETs. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chenming_Hu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Li-Chen_Wang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Nilotpal_Choudhury>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Nirmaan_Shanker>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sayeef_S._Salahuddin>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Souvik_Mahapatra>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Suraj_S._Cheema>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Wenshen_Li>
swrc:pages 421-422 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/vlsit/2022>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/vlsit/ShankerWCLCHMS22/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/vlsit/ShankerWCLCHMS22>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/vlsit/vlsit2022.html#ShankerWCLCHMS22>
rdfs:seeAlso <https://doi.org/10.1109/VLSITechnologyandCir46769.2022.9830440>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/vlsit>
dc:title On the PBTI Reliability of Low EOT Negative Capacitance 1.8 nm HfO2-ZrO2 Superlattice Gate Stack on Lg=90 nm nFETs. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document