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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/vlsit/SonPJKKCYKJMHJS23>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Byungmoo_Song>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Changkeun_Yoon>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Changmin_Hong>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Gitae_Jeong>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ja-Hum_Ku>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jaehun_Jeong>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jiho_Kim>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ju-Youn_Kim>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jun-Gyu_Kim>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Keonyong_Cheon>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kihwang_Son>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kyunghoon_Jung>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Min-Chul_Sun>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Seulki_Park>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sungil_Jo>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Taehun_Myung>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Weonwi_Jang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Younggun_Ko>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yuri_Yasuda-Masuoka>
foaf:homepage <http://dx.doi.org/doi.org%2F10.23919%2FVLSITechnologyandCir57934.2023.10185365>
foaf:homepage <https://doi.org/10.23919/VLSITechnologyandCir57934.2023.10185365>
dc:identifier DBLP conf/vlsit/SonPJKKCYKJMHJS23 (xsd:string)
dc:identifier DOI doi.org%2F10.23919%2FVLSITechnologyandCir57934.2023.10185365 (xsd:string)
dcterms:issued 2023 (xsd:gYear)
rdfs:label Highly Reliable/Manufacturable 4nm FinFET Platform Technology (SF4X) for HPC Application with Dual-CPP/HP-HD Standard Cells. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Byungmoo_Song>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Changkeun_Yoon>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Changmin_Hong>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Gitae_Jeong>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ja-Hum_Ku>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jaehun_Jeong>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jiho_Kim>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ju-Youn_Kim>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jun-Gyu_Kim>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Keonyong_Cheon>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kihwang_Son>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kyunghoon_Jung>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Min-Chul_Sun>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Seulki_Park>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sungil_Jo>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Taehun_Myung>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Weonwi_Jang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Younggun_Ko>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yuri_Yasuda-Masuoka>
swrc:pages 1-2 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/vlsit/2023>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/vlsit/SonPJKKCYKJMHJS23/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/vlsit/SonPJKKCYKJMHJS23>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/vlsit/vlsit2023.html#SonPJKKCYKJMHJS23>
rdfs:seeAlso <https://doi.org/10.23919/VLSITechnologyandCir57934.2023.10185365>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/vlsit>
dc:title Highly Reliable/Manufacturable 4nm FinFET Platform Technology (SF4X) for HPC Application with Dual-CPP/HP-HD Standard Cells. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document