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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/wsc/GovindF03>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/David_Fronckowiak>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Nirmal_Govind>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FWSC.2003.1261582>
foaf:homepage <https://doi.org/10.1109/WSC.2003.1261582>
dc:identifier DBLP conf/wsc/GovindF03 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FWSC.2003.1261582 (xsd:string)
dcterms:issued 2003 (xsd:gYear)
rdfs:label Process equipment modeling: resident-entity based simulation of batch chamber tools in 300mm semiconductor manufacturing. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/David_Fronckowiak>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Nirmal_Govind>
swrc:pages 1398-1405 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/wsc/2003>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/wsc/GovindF03/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/wsc/GovindF03>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/wsc/wsc2003.html#GovindF03>
rdfs:seeAlso <https://doi.org/10.1109/WSC.2003.1261582>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/wsc>
dc:title Process equipment modeling: resident-entity based simulation of batch chamber tools in 300mm semiconductor manufacturing. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document