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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/wsc/NayaniM98>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Mansooreh_Mollaghasemi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Nirupama_Nayani>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FWSC.1998.745835>
foaf:homepage <https://doi.org/10.1109/WSC.1998.745835>
dc:identifier DBLP conf/wsc/NayaniM98 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FWSC.1998.745835 (xsd:string)
dcterms:issued 1998 (xsd:gYear)
rdfs:label Validation and Verification of the Simulation Model of a Photolithography Process in Semiconductor Manufacturing. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Mansooreh_Mollaghasemi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Nirupama_Nayani>
swrc:pages 1017-1022 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/wsc/1998>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/wsc/NayaniM98/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/wsc/NayaniM98>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/wsc/wsc1998.html#NayaniM98>
rdfs:seeAlso <https://doi.org/10.1109/WSC.1998.745835>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/wsc>
dc:title Validation and Verification of the Simulation Model of a Photolithography Process in Semiconductor Manufacturing. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document