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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/wsc/TrybulaWAG05>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kranthi_Mitra_Adusumilli>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Randy_K._Goodall>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Robert_L._Wright>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Walter_J._Trybula>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FWSC.2005.1574509>
foaf:homepage <https://doi.org/10.1109/WSC.2005.1574509>
dc:identifier DBLP conf/wsc/TrybulaWAG05 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FWSC.2005.1574509 (xsd:string)
dcterms:issued 2005 (xsd:gYear)
rdfs:label An analysis: traditional semiconductor lithography versus emerging technology (nano imprint). (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kranthi_Mitra_Adusumilli>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Randy_K._Goodall>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Robert_L._Wright>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Walter_J._Trybula>
swrc:pages 2218-2222 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/wsc/2005>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/wsc/TrybulaWAG05/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/wsc/TrybulaWAG05>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/wsc/wsc2005.html#TrybulaWAG05>
rdfs:seeAlso <https://doi.org/10.1109/WSC.2005.1574509>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/wsc>
dc:title An analysis: traditional semiconductor lithography versus emerging technology (nano imprint). (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document