Low-Voltage Permittivity Control of Coplanar Lines Based on Hafnium Oxide Ferroelectrics Grown on Silicon.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/journals/access/AldrigoDINVDV19
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dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/journals/access/AldrigoDINVDV19
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Adrian_Dinescu
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Dan_Vasilache
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Florin_Nastase
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Martino_Aldrigo
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Mircea_Dragoman
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Sergiu_Iordanescu
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Silviu_Vulpe
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2FACCESS.2019.2942430
>
foaf:
homepage
<
https://doi.org/10.1109/ACCESS.2019.2942430
>
dc:
identifier
DBLP journals/access/AldrigoDINVDV19
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2FACCESS.2019.2942430
(xsd:string)
dcterms:
issued
2019
(xsd:gYear)
swrc:
journal
<
https://dblp.l3s.de/d2r/resource/journals/access
>
rdfs:
label
Low-Voltage Permittivity Control of Coplanar Lines Based on Hafnium Oxide Ferroelectrics Grown on Silicon.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Adrian_Dinescu
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Dan_Vasilache
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Florin_Nastase
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Martino_Aldrigo
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Mircea_Dragoman
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Sergiu_Iordanescu
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Silviu_Vulpe
>
swrc:
pages
136686-136693
(xsd:string)
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/journals/access/AldrigoDINVDV19/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/journals/access/AldrigoDINVDV19
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/journals/access/access7.html#AldrigoDINVDV19
>
rdfs:
seeAlso
<
https://doi.org/10.1109/ACCESS.2019.2942430
>
dc:
title
Low-Voltage Permittivity Control of Coplanar Lines Based on Hafnium Oxide Ferroelectrics Grown on Silicon.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:Article
rdf:
type
foaf:Document
swrc:
volume
7
(xsd:string)