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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/access/KledrowetzHPF20>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jiri_Haze>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Lukas_Fujcik>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Roman_Prokop>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Vilem_Kledrowetz>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FACCESS.2020.3034790>
foaf:homepage <https://doi.org/10.1109/ACCESS.2020.3034790>
dc:identifier DBLP journals/access/KledrowetzHPF20 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FACCESS.2020.3034790 (xsd:string)
dcterms:issued 2020 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/access>
rdfs:label An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jiri_Haze>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Lukas_Fujcik>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Roman_Prokop>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Vilem_Kledrowetz>
swrc:pages 197263-197275 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/access/KledrowetzHPF20/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/access/KledrowetzHPF20>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/access/access8.html#KledrowetzHPF20>
rdfs:seeAlso <https://doi.org/10.1109/ACCESS.2020.3034790>
dc:title An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 8 (xsd:string)