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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/air/LeungLK04>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/C._K._Kwong_0001>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Henry_C._W._Lau>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ricky_W._K._Leung>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1023%2FB%3AAIRE.0000020937.82267.32>
foaf:homepage <https://doi.org/10.1023/B:AIRE.0000020937.82267.32>
dc:identifier DBLP journals/air/LeungLK04 (xsd:string)
dc:identifier DOI doi.org%2F10.1023%2FB%3AAIRE.0000020937.82267.32 (xsd:string)
dcterms:issued 2004 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/air>
rdfs:label An Intelligent System to Monitor the Chemical Concentration of Electroplating Process: An Integrated OLAP and Fuzzy Logic Approach. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/C._K._Kwong_0001>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Henry_C._W._Lau>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ricky_W._K._Leung>
swrc:number 2 (xsd:string)
swrc:pages 139-159 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/air/LeungLK04/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/air/LeungLK04>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/air/air21.html#LeungLK04>
rdfs:seeAlso <https://doi.org/10.1023/B:AIRE.0000020937.82267.32>
dc:subject fuzzy logic; knowledge learning; machine learning; On-Line Analytical Processing (OLAP) (xsd:string)
dc:title An Intelligent System to Monitor the Chemical Concentration of Electroplating Process: An Integrated OLAP and Fuzzy Logic Approach. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 21 (xsd:string)