Device photolithography: Electron-sensitive materials. | D2R Server publishing the DBLP Bibliography Database, hosted at L3S Research Center

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dc:creator	<https://dblp.l3s.de/d2r/resource/authors/Barret_Broyde>
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foaf:homepage	<https://doi.org/10.1002/j.1538-7305.1970.tb02515.x>
dc:identifier	DBLP journals/bstj/Broyde70 (xsd:string)
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dcterms:issued	1970 (xsd:gYear)
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rdfs:label	Device photolithography: Electron-sensitive materials. (xsd:string)
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swrc:number	9 (xsd:string)
swrc:pages	2095-2104 (xsd:string)
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rdfs:seeAlso	<http://dblp.uni-trier.de/db/journals/bstj/bstj49.html#Broyde70>
rdfs:seeAlso	<https://doi.org/10.1002/j.1538-7305.1970.tb02515.x>
dc:title	Device photolithography: Electron-sensitive materials. (xsd:string)
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