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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/bstj/HowlandP70>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/F._L._Howland>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/K._M._Poole>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1002%2Fj.1538-7305.1970.tb02507.x>
foaf:homepage <https://doi.org/10.1002/j.1538-7305.1970.tb02507.x>
dc:identifier DBLP journals/bstj/HowlandP70 (xsd:string)
dc:identifier DOI doi.org%2F10.1002%2Fj.1538-7305.1970.tb02507.x (xsd:string)
dcterms:issued 1970 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/bstj>
rdfs:label Device photolithography: An overview of the new mask-making system. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/F._L._Howland>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/K._M._Poole>
swrc:number 9 (xsd:string)
swrc:pages 1997-2009 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/bstj/HowlandP70/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/bstj/HowlandP70>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/bstj/bstj49.html#HowlandP70>
rdfs:seeAlso <https://doi.org/10.1002/j.1538-7305.1970.tb02507.x>
dc:title Device photolithography: An overview of the new mask-making system. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 49 (xsd:string)