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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/bstj/KossykLRS70>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/G._J._W._Kossyk>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/J._P._Laico>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/J._W._Stafford>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/L._Rongved>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1002%2Fj.1538-7305.1970.tb02511.x>
foaf:homepage <https://doi.org/10.1002/j.1538-7305.1970.tb02511.x>
dc:identifier DBLP journals/bstj/KossykLRS70 (xsd:string)
dc:identifier DOI doi.org%2F10.1002%2Fj.1538-7305.1970.tb02511.x (xsd:string)
dcterms:issued 1970 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/bstj>
rdfs:label Device photolithography: The primary pattern generator part ii-mechanical design. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/G._J._W._Kossyk>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/J._P._Laico>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/J._W._Stafford>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/L._Rongved>
swrc:number 9 (xsd:string)
swrc:pages 2043-2059 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/bstj/KossykLRS70/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/bstj/KossykLRS70>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/bstj/bstj49.html#KossykLRS70>
rdfs:seeAlso <https://doi.org/10.1002/j.1538-7305.1970.tb02511.x>
dc:title Device photolithography: The primary pattern generator part ii-mechanical design. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 49 (xsd:string)