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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/dt/SodenH86>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Charles_F._Hawkins>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jerry_M._Soden>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FMDT.1986.294977>
foaf:homepage <https://doi.org/10.1109/MDT.1986.294977>
dc:identifier DBLP journals/dt/SodenH86 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FMDT.1986.294977 (xsd:string)
dcterms:issued 1986 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/dt>
rdfs:label Test Considerations for Gate Oxide Shorts in CMOS ICs. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Charles_F._Hawkins>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jerry_M._Soden>
swrc:number 4 (xsd:string)
swrc:pages 56-64 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/dt/SodenH86/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/dt/SodenH86>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/dt/dt3.html#SodenH86>
rdfs:seeAlso <https://doi.org/10.1109/MDT.1986.294977>
dc:title Test Considerations for Gate Oxide Shorts in CMOS ICs. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 3 (xsd:string)