A Layout Sensitivity Model for Estimating Electromigration-vulnerable Narrow Interconnects.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/journals/et/GhaidaZ09
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2009
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A Layout Sensitivity Model for Estimating Electromigration-vulnerable Narrow Interconnects.
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Yield modeling; Yield prediction; Electromigration; Layout sensitivity; Critical area; Spot defects; Narrow defects
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A Layout Sensitivity Model for Estimating Electromigration-vulnerable Narrow Interconnects.
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