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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/ibmrd/EllisB99>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kenneth_A._Ellis>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Robert_A._Buhrman>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1147%2Frd.433.0287>
foaf:homepage <https://doi.org/10.1147/rd.433.0287>
dc:identifier DBLP journals/ibmrd/EllisB99 (xsd:string)
dc:identifier DOI doi.org%2F10.1147%2Frd.433.0287 (xsd:string)
dcterms:issued 1999 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/ibmrd>
rdfs:label Nitrous oxide (N2O) processing for silicon oxynitride gate dielectrics. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kenneth_A._Ellis>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Robert_A._Buhrman>
swrc:number 3 (xsd:string)
swrc:pages 287-300 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/ibmrd/EllisB99/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/ibmrd/EllisB99>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/ibmrd/ibmrd43.html#EllisB99>
rdfs:seeAlso <https://doi.org/10.1147/rd.433.0287>
dc:title Nitrous oxide (N2O) processing for silicon oxynitride gate dielectrics. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 43 (xsd:string)