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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/ibmrd/MagerleinW80>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/D._J._Webb>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/J._H._Magerlein>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1147%2Frd.245.0554>
foaf:homepage <https://doi.org/10.1147/rd.245.0554>
dc:identifier DBLP journals/ibmrd/MagerleinW80 (xsd:string)
dc:identifier DOI doi.org%2F10.1147%2Frd.245.0554 (xsd:string)
dcterms:issued 1980 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/ibmrd>
rdfs:label Electron-Beam Resists for Lift-Off Processing with Potential Application to Josephson Integrated Circuits. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/D._J._Webb>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/J._H._Magerlein>
swrc:number 5 (xsd:string)
swrc:pages 554-562 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/ibmrd/MagerleinW80/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/ibmrd/MagerleinW80>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/ibmrd/ibmrd24.html#MagerleinW80>
rdfs:seeAlso <https://doi.org/10.1147/rd.245.0554>
dc:title Electron-Beam Resists for Lift-Off Processing with Potential Application to Josephson Integrated Circuits. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 24 (xsd:string)