Electron-Beam Resists for Lift-Off Processing with Potential Application to Josephson Integrated Circuits.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/journals/ibmrd/MagerleinW80
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Electron-Beam Resists for Lift-Off Processing with Potential Application to Josephson Integrated Circuits.
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Electron-Beam Resists for Lift-Off Processing with Potential Application to Josephson Integrated Circuits.
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