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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/ieiceee/HanHO13>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Dae-Hee_Han>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Huiseong_Han>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shun%27ichiro_Ohmi>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1587%2Felex.10.20130651>
foaf:homepage <https://doi.org/10.1587/elex.10.20130651>
dc:identifier DBLP journals/ieiceee/HanHO13 (xsd:string)
dc:identifier DOI doi.org%2F10.1587%2Felex.10.20130651 (xsd:string)
dcterms:issued 2013 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/ieiceee>
rdfs:label Impact of Si surface roughness on MOSFET characteristics with ultrathin HfON gate insulator formed by ECR plasma sputtering. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Dae-Hee_Han>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Huiseong_Han>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shun%27ichiro_Ohmi>
swrc:number 18 (xsd:string)
swrc:pages 20130651 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/ieiceee/HanHO13/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/ieiceee/HanHO13>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/ieiceee/ieiceee10.html#HanHO13>
rdfs:seeAlso <https://doi.org/10.1587/elex.10.20130651>
dc:title Impact of Si surface roughness on MOSFET characteristics with ultrathin HfON gate insulator formed by ECR plasma sputtering. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 10 (xsd:string)