An Effective Model of the Overshooting Effect for Multiple-Input Gates in Nanometer Technologies.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/journals/ieicet/DingHKWI14
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An Effective Model of the Overshooting Effect for Multiple-Input Gates in Nanometer Technologies.
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An Effective Model of the Overshooting Effect for Multiple-Input Gates in Nanometer Technologies.
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