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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/ieicet/Nakao16>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Masashi_Nakao>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1587%2Ftransele.E99.C.333>
foaf:homepage <https://doi.org/10.1587/transele.E99.C.333>
dc:identifier DBLP journals/ieicet/Nakao16 (xsd:string)
dc:identifier DOI doi.org%2F10.1587%2Ftransele.E99.C.333 (xsd:string)
dcterms:issued 2016 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/ieicet>
rdfs:label Recent Situation of the UV Imprint Lithography and Its Application to the Photonics Devices. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Masashi_Nakao>
swrc:number 3 (xsd:string)
swrc:pages 333-338 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/ieicet/Nakao16/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/ieicet/Nakao16>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/ieicet/ieicet99c.html#Nakao16>
rdfs:seeAlso <https://doi.org/10.1587/transele.E99.C.333>
dc:title Recent Situation of the UV Imprint Lithography and Its Application to the Photonics Devices. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 99-C (xsd:string)