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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/ieicet/OhmiTM19>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Rengie_Mark_D._Mailig>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shun%27ichiro_Ohmi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yuya_Tsukamoto>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1587%2Ftransele.2018FUP0003>
foaf:homepage <https://doi.org/10.1587/transele.2018FUP0003>
dc:identifier DBLP journals/ieicet/OhmiTM19 (xsd:string)
dc:identifier DOI doi.org%2F10.1587%2Ftransele.2018FUP0003 (xsd:string)
dcterms:issued 2019 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/ieicet>
rdfs:label Etching Control of HfN Encapsulating Layer for PtHf-Silicide Formation with Dopant Segregation Process. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Rengie_Mark_D._Mailig>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shun%27ichiro_Ohmi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yuya_Tsukamoto>
swrc:number 6 (xsd:string)
swrc:pages 453-457 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/ieicet/OhmiTM19/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/ieicet/OhmiTM19>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/ieicet/ieicet102c.html#OhmiTM19>
rdfs:seeAlso <https://doi.org/10.1587/transele.2018FUP0003>
dc:title Etching Control of HfN Encapsulating Layer for PtHf-Silicide Formation with Dopant Segregation Process. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 102-C (xsd:string)