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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/ieicet/TanabeHKOHS12>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Akihiro_Tanabe>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Akira_Honma>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Hironori_Oomori>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Masahiro_Hanmura>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Takeyoshi_Katoh>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Teruhiko_Suzuki>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1587%2Ftransele.E95.C.1737>
foaf:homepage <https://doi.org/10.1587/transele.E95.C.1737>
dc:identifier DBLP journals/ieicet/TanabeHKOHS12 (xsd:string)
dc:identifier DOI doi.org%2F10.1587%2Ftransele.E95.C.1737 (xsd:string)
dcterms:issued 2012 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/ieicet>
rdfs:label Solution-Processed Photosensitive Passivation Layer for an a-Si TFT for LCDs with a Low Dielectric Constant. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Akihiro_Tanabe>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Akira_Honma>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Hironori_Oomori>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Masahiro_Hanmura>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Takeyoshi_Katoh>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Teruhiko_Suzuki>
swrc:number 11 (xsd:string)
swrc:pages 1737-1743 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/ieicet/TanabeHKOHS12/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/ieicet/TanabeHKOHS12>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/ieicet/ieicet95c.html#TanabeHKOHS12>
rdfs:seeAlso <https://doi.org/10.1587/transele.E95.C.1737>
dc:title Solution-Processed Photosensitive Passivation Layer for an a-Si TFT for LCDs with a Low Dielectric Constant. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 95-C (xsd:string)