The Effect of Kr/O2 Sputtering on the Ferroelectric Properties of SrBi2Ta2O9 Thin Film Formation.
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dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/journals/ieicet/ZengLPLZO19
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Binjian_Zeng
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Jiajia_Liao
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Min_Liao
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Qiangxiang_Peng
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Shun%27ichiro_Ohmi
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Yichun_Zhou
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1587%2Ftransele.2018FUP0005
>
foaf:
homepage
<
https://doi.org/10.1587/transele.2018FUP0005
>
dc:
identifier
DBLP journals/ieicet/ZengLPLZO19
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1587%2Ftransele.2018FUP0005
(xsd:string)
dcterms:
issued
2019
(xsd:gYear)
swrc:
journal
<
https://dblp.l3s.de/d2r/resource/journals/ieicet
>
rdfs:
label
The Effect of Kr/O2 Sputtering on the Ferroelectric Properties of SrBi2Ta2O9 Thin Film Formation.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Binjian_Zeng
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Jiajia_Liao
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Min_Liao
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Qiangxiang_Peng
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Shun%27ichiro_Ohmi
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Yichun_Zhou
>
swrc:
number
6
(xsd:string)
swrc:
pages
441-446
(xsd:string)
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/journals/ieicet/ZengLPLZO19/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/journals/ieicet/ZengLPLZO19
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/journals/ieicet/ieicet102c.html#ZengLPLZO19
>
rdfs:
seeAlso
<
https://doi.org/10.1587/transele.2018FUP0005
>
dc:
title
The Effect of Kr/O2 Sputtering on the Ferroelectric Properties of SrBi2Ta2O9 Thin Film Formation.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:Article
rdf:
type
foaf:Document
swrc:
volume
102-C
(xsd:string)