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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/ieicetc/OhmiIHK20>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shin_Ishimatsu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shun%27ichiro_Ohmi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sohya_Kudoh>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yuske_Horiuchi>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1587%2Ftransele.2019FUP0001>
foaf:homepage <https://doi.org/10.1587/transele.2019FUP0001>
dc:identifier DBLP journals/ieicetc/OhmiIHK20 (xsd:string)
dc:identifier DOI doi.org%2F10.1587%2Ftransele.2019FUP0001 (xsd:string)
dcterms:issued 2020 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/ieicetc>
rdfs:label In-Situ N2-Plasma Nitridation for High-k HfN Gate Insulator Formed by Electron Cyclotron Resonance Plasma Sputtering. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shin_Ishimatsu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shun%27ichiro_Ohmi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sohya_Kudoh>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yuske_Horiuchi>
swrc:number 6 (xsd:string)
swrc:pages 299-303 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/ieicetc/OhmiIHK20/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/ieicetc/OhmiIHK20>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/ieicetc/ieicetc103.html#OhmiIHK20>
rdfs:seeAlso <https://doi.org/10.1587/transele.2019FUP0001>
dc:title In-Situ N2-Plasma Nitridation for High-k HfN Gate Insulator Formed by Electron Cyclotron Resonance Plasma Sputtering. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 103-C (xsd:string)