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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/ijat/HamzensKMUOK23>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Afif_Hamzens>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Hiroaki_Kakiuchi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Hiromasa_Ohmi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kento_Kitamura>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Leapheng_Uon>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shota_Mochizuki>
foaf:homepage <http://dx.doi.org/doi.org%2F10.20965%2Fijat.2023.p0575>
foaf:homepage <https://doi.org/10.20965/ijat.2023.p0575>
dc:identifier DBLP journals/ijat/HamzensKMUOK23 (xsd:string)
dc:identifier DOI doi.org%2F10.20965%2Fijat.2023.p0575 (xsd:string)
dcterms:issued 2023 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/ijat>
rdfs:label Organosilicon-Based Thin Film Formation in Very High-Frequency Plasma Under Atmospheric Pressure. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Afif_Hamzens>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Hiroaki_Kakiuchi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Hiromasa_Ohmi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kento_Kitamura>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Leapheng_Uon>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shota_Mochizuki>
swrc:month November (xsd:string)
swrc:number 6 (xsd:string)
swrc:pages 575-582 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/ijat/HamzensKMUOK23/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/ijat/HamzensKMUOK23>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/ijat/ijat17.html#HamzensKMUOK23>
rdfs:seeAlso <https://doi.org/10.20965/ijat.2023.p0575>
dc:title Organosilicon-Based Thin Film Formation in Very High-Frequency Plasma Under Atmospheric Pressure. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 17 (xsd:string)