Organosilicon-Based Thin Film Formation in Very High-Frequency Plasma Under Atmospheric Pressure.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/journals/ijat/HamzensKMUOK23
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Organosilicon-Based Thin Film Formation in Very High-Frequency Plasma Under Atmospheric Pressure.
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Organosilicon-Based Thin Film Formation in Very High-Frequency Plasma Under Atmospheric Pressure.
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