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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/information/0001AGVB23>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Alexios_N._Birbas>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Aris_Magklaras_0001>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Christos_Gogos>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Christos_Valouxis>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Panayiotis_Alefragis>
foaf:homepage <http://dx.doi.org/doi.org%2F10.3390%2Finfo14080428>
foaf:homepage <https://doi.org/10.3390/info14080428>
dc:identifier DBLP journals/information/0001AGVB23 (xsd:string)
dc:identifier DOI doi.org%2F10.3390%2Finfo14080428 (xsd:string)
dcterms:issued 2023 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/information>
rdfs:label A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Alexios_N._Birbas>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Aris_Magklaras_0001>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Christos_Gogos>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Christos_Valouxis>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Panayiotis_Alefragis>
swrc:number 8 (xsd:string)
swrc:pages 428 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/information/0001AGVB23/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/information/0001AGVB23>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/information/information14.html#0001AGVB23>
rdfs:seeAlso <https://doi.org/10.3390/info14080428>
dc:title A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 14 (xsd:string)