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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/jcst/GalliereRAB05>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Florence_Aza%E2%88%9A%C4%AEs>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jean_Marc_Galli%E2%88%9A%C2%AEre>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Michel_Renovell>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yves_Bertrand>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1007%2Fs11390-005-0195-x>
foaf:homepage <https://doi.org/10.1007/s11390-005-0195-x>
dc:identifier DBLP journals/jcst/GalliereRAB05 (xsd:string)
dc:identifier DOI doi.org%2F10.1007%2Fs11390-005-0195-x (xsd:string)
dcterms:issued 2005 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/jcst>
rdfs:label Delay Testing Viability of Gate Oxide Short Defects. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Florence_Aza%E2%88%9A%C4%AEs>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jean_Marc_Galli%E2%88%9A%C2%AEre>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Michel_Renovell>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yves_Bertrand>
swrc:number 2 (xsd:string)
swrc:pages 195-200 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/jcst/GalliereRAB05/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/jcst/GalliereRAB05>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/jcst/jcst20.html#GalliereRAB05>
rdfs:seeAlso <https://doi.org/10.1007/s11390-005-0195-x>
dc:subject VLSI; delay testing; defect; gate oxide short (GOS) (xsd:string)
dc:title Delay Testing Viability of Gate Oxide Short Defects. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 20 (xsd:string)