Effects of substrate resistances on LNA performance and a bondpad structure for reducing the effects in a silicon bipolar technology.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/journals/jssc/ColvinBO99
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dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/journals/jssc/ColvinBO99
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/John_T._Colvin
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Kenneth_K._O
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Saket_S._Bhatia
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2F4.782095
>
foaf:
homepage
<
https://doi.org/10.1109/4.782095
>
dc:
identifier
DBLP journals/jssc/ColvinBO99
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2F4.782095
(xsd:string)
dcterms:
issued
1999
(xsd:gYear)
swrc:
journal
<
https://dblp.l3s.de/d2r/resource/journals/jssc
>
rdfs:
label
Effects of substrate resistances on LNA performance and a bondpad structure for reducing the effects in a silicon bipolar technology.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/John_T._Colvin
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Kenneth_K._O
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Saket_S._Bhatia
>
swrc:
number
9
(xsd:string)
swrc:
pages
1339-1344
(xsd:string)
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/journals/jssc/ColvinBO99/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/journals/jssc/ColvinBO99
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/journals/jssc/jssc34.html#ColvinBO99
>
rdfs:
seeAlso
<
https://doi.org/10.1109/4.782095
>
dc:
title
Effects of substrate resistances on LNA performance and a bondpad structure for reducing the effects in a silicon bipolar technology.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:Article
rdf:
type
foaf:Document
swrc:
volume
34
(xsd:string)