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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/jzusc/ZhongSWWLDDJ17>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Haili_Wang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Peng_Ding>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shu-xiang_Sun>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Wen-bin_Wong>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Xiao-Ming_Liu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yinghui_Zhong>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Zhi_Jin>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Zhiyong_Duan>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1631%2FFITEE.1601121>
foaf:homepage <https://doi.org/10.1631/FITEE.1601121>
dc:identifier DBLP journals/jzusc/ZhongSWWLDDJ17 (xsd:string)
dc:identifier DOI doi.org%2F10.1631%2FFITEE.1601121 (xsd:string)
dcterms:issued 2017 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/jzusc>
rdfs:label Two-step gate-recess process combining selective wet-etching and digital wet-etching for InAlAs/InGaAs InP-based HEMTs. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Haili_Wang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Peng_Ding>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shu-xiang_Sun>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Wen-bin_Wong>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Xiao-Ming_Liu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yinghui_Zhong>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Zhi_Jin>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Zhiyong_Duan>
swrc:number 8 (xsd:string)
swrc:pages 1180-1185 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/jzusc/ZhongSWWLDDJ17/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/jzusc/ZhongSWWLDDJ17>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/jzusc/jzusc18.html#ZhongSWWLDDJ17>
rdfs:seeAlso <https://doi.org/10.1631/FITEE.1601121>
dc:title Two-step gate-recess process combining selective wet-etching and digital wet-etching for InAlAs/InGaAs InP-based HEMTs. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 18 (xsd:string)