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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/micromachines/ChenHLLY16>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chao-Ming_Hsu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Cheng-Fu_Yang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jing_Liu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kun-Neng_Chen>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yu-Chen_Liou>
foaf:homepage <http://dx.doi.org/doi.org%2F10.3390%2Fmi7090151>
foaf:homepage <https://doi.org/10.3390/mi7090151>
dc:identifier DBLP journals/micromachines/ChenHLLY16 (xsd:string)
dc:identifier DOI doi.org%2F10.3390%2Fmi7090151 (xsd:string)
dcterms:issued 2016 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/micromachines>
rdfs:label Investigation of Antireflection Nb2O5 Thin Films by the Sputtering Method under Different Deposition Parameters. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chao-Ming_Hsu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Cheng-Fu_Yang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jing_Liu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kun-Neng_Chen>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yu-Chen_Liou>
swrc:number 9 (xsd:string)
swrc:pages 151 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/micromachines/ChenHLLY16/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/micromachines/ChenHLLY16>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/micromachines/micromachines7.html#ChenHLLY16>
rdfs:seeAlso <https://doi.org/10.3390/mi7090151>
dc:title Investigation of Antireflection Nb2O5 Thin Films by the Sputtering Method under Different Deposition Parameters. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 7 (xsd:string)