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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/mj/YangC06>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Tsun-Ching_Chang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yung-Kuang_Yang>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1016%2Fj.mejo.2005.10.006>
foaf:homepage <https://doi.org/10.1016/j.mejo.2005.10.006>
dc:identifier DBLP journals/mj/YangC06 (xsd:string)
dc:identifier DOI doi.org%2F10.1016%2Fj.mejo.2005.10.006 (xsd:string)
dcterms:issued 2006 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/mj>
rdfs:label Experimental analysis and optimization of a photo resist coating process for photolithography in wafer fabrication. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Tsun-Ching_Chang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yung-Kuang_Yang>
swrc:number 8 (xsd:string)
swrc:pages 746-751 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/mj/YangC06/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/mj/YangC06>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/mj/mj37.html#YangC06>
rdfs:seeAlso <https://doi.org/10.1016/j.mejo.2005.10.006>
dc:title Experimental analysis and optimization of a photo resist coating process for photolithography in wafer fabrication. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 37 (xsd:string)