Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/journals/mr/BeckxDLHCPSJBD05
Home
|
Example Publications
Property
Value
dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/journals/mr/BeckxDLHCPSJBD05
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/D._Shamiryan
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/K._Henson
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/M._Claes
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/M._Demand
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/P._Jaenen
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/S._Beckx
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/S._Degendt
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/S._Locorotondo
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/V._Paraschiv
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/W._Boullart
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1016%2Fj.microrel.2004.11.005
>
foaf:
homepage
<
https://doi.org/10.1016/j.microrel.2004.11.005
>
dc:
identifier
DBLP journals/mr/BeckxDLHCPSJBD05
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1016%2Fj.microrel.2004.11.005
(xsd:string)
dcterms:
issued
2005
(xsd:gYear)
swrc:
journal
<
https://dblp.l3s.de/d2r/resource/journals/mr
>
rdfs:
label
Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/D._Shamiryan
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/K._Henson
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/M._Claes
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/M._Demand
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/P._Jaenen
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/S._Beckx
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/S._Degendt
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/S._Locorotondo
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/V._Paraschiv
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/W._Boullart
>
swrc:
number
5-6
(xsd:string)
swrc:
pages
1007-1011
(xsd:string)
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/journals/mr/BeckxDLHCPSJBD05/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/journals/mr/BeckxDLHCPSJBD05
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/journals/mr/mr45.html#BeckxDLHCPSJBD05
>
rdfs:
seeAlso
<
https://doi.org/10.1016/j.microrel.2004.11.005
>
dc:
title
Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:Article
rdf:
type
foaf:Document
swrc:
volume
45
(xsd:string)