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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/mr/BeckxDLHCPSJBD05>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/D._Shamiryan>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/K._Henson>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/M._Claes>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/M._Demand>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/P._Jaenen>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/S._Beckx>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/S._Degendt>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/S._Locorotondo>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/V._Paraschiv>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/W._Boullart>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1016%2Fj.microrel.2004.11.005>
foaf:homepage <https://doi.org/10.1016/j.microrel.2004.11.005>
dc:identifier DBLP journals/mr/BeckxDLHCPSJBD05 (xsd:string)
dc:identifier DOI doi.org%2F10.1016%2Fj.microrel.2004.11.005 (xsd:string)
dcterms:issued 2005 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/mr>
rdfs:label Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/D._Shamiryan>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/K._Henson>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/M._Claes>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/M._Demand>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/P._Jaenen>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/S._Beckx>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/S._Degendt>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/S._Locorotondo>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/V._Paraschiv>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/W._Boullart>
swrc:number 5-6 (xsd:string)
swrc:pages 1007-1011 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/mr/BeckxDLHCPSJBD05/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/mr/BeckxDLHCPSJBD05>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/mr/mr45.html#BeckxDLHCPSJBD05>
rdfs:seeAlso <https://doi.org/10.1016/j.microrel.2004.11.005>
dc:title Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 45 (xsd:string)