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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/mr/GagnardRB01>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Olivier_Bonnaud>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Xavier_Gagnard>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yannick_Rey-Tauriac>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1016%2FS0026-2714%2801%2900213-X>
foaf:homepage <https://doi.org/10.1016/S0026-2714(01)00213-X>
dc:identifier DBLP journals/mr/GagnardRB01 (xsd:string)
dc:identifier DOI doi.org%2F10.1016%2FS0026-2714%2801%2900213-X (xsd:string)
dcterms:issued 2001 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/mr>
rdfs:label Polysilicon oxide quality optimization at Wafer level of a Bipolar/CMOS/DMOS technology. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Olivier_Bonnaud>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Xavier_Gagnard>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yannick_Rey-Tauriac>
swrc:number 9-10 (xsd:string)
swrc:pages 1335-1340 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/mr/GagnardRB01/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/mr/GagnardRB01>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/mr/mr41.html#GagnardRB01>
rdfs:seeAlso <https://doi.org/10.1016/S0026-2714(01)00213-X>
dc:title Polysilicon oxide quality optimization at Wafer level of a Bipolar/CMOS/DMOS technology. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 41 (xsd:string)