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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/mr/HerthLBRL10>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Bernard_Legrand>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Etienne_Herth>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Lionel_Buchaillot>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Nathalie_Rolland>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Tuami_Lasri>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1016%2Fj.microrel.2010.04.011>
foaf:homepage <https://doi.org/10.1016/j.microrel.2010.04.011>
dc:identifier DBLP journals/mr/HerthLBRL10 (xsd:string)
dc:identifier DOI doi.org%2F10.1016%2Fj.microrel.2010.04.011 (xsd:string)
dcterms:issued 2010 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/mr>
rdfs:label Optimization of SiNX: H films deposited by PECVD for reliability of electronic, microsystems and optical applications. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Bernard_Legrand>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Etienne_Herth>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Lionel_Buchaillot>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Nathalie_Rolland>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Tuami_Lasri>
swrc:number 8 (xsd:string)
swrc:pages 1103-1106 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/mr/HerthLBRL10/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/mr/HerthLBRL10>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/mr/mr50.html#HerthLBRL10>
rdfs:seeAlso <https://doi.org/10.1016/j.microrel.2010.04.011>
dc:title Optimization of SiNX: H films deposited by PECVD for reliability of electronic, microsystems and optical applications. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 50 (xsd:string)