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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/mr/HlaliHMKS17>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/A._Kalboussi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Abdelkader_Souifi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Liviu_Militaru>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Neila_Hizem>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Slah_Hlali>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1016%2Fj.microrel.2017.06.056>
foaf:homepage <https://doi.org/10.1016/j.microrel.2017.06.056>
dc:identifier DBLP journals/mr/HlaliHMKS17 (xsd:string)
dc:identifier DOI doi.org%2F10.1016%2Fj.microrel.2017.06.056 (xsd:string)
dcterms:issued 2017 (xsd:gYear)
swrc:journal <https://dblp.l3s.de/d2r/resource/journals/mr>
rdfs:label Effect of interface traps for ultra-thin high-k gate dielectric based MIS devices on the capacitance-voltage characteristics. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/A._Kalboussi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Abdelkader_Souifi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Liviu_Militaru>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Neila_Hizem>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Slah_Hlali>
swrc:pages 154-161 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/mr/HlaliHMKS17/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/mr/HlaliHMKS17>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/mr/mr75.html#HlaliHMKS17>
rdfs:seeAlso <https://doi.org/10.1016/j.microrel.2017.06.056>
dc:title Effect of interface traps for ultra-thin high-k gate dielectric based MIS devices on the capacitance-voltage characteristics. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 75 (xsd:string)