Characterisation and passivation of interface defects in (1 0 0)-Si/SiO2/HfO2/TiN gate stacks.
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Characterisation and passivation of interface defects in (1 0 0)-Si/SiO2/HfO2/TiN gate stacks.
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Characterisation and passivation of interface defects in (1 0 0)-Si/SiO2/HfO2/TiN gate stacks.
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